논문 국내 국제전문학술지(SCI급) Interface Reactions and Diffusion of Si3N4 / Ti and Si3N4 / TiAl Alloys
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2017-11
- 저자명 Kwang Su Choi, Sun Jin Kim, Ji Eun Lee, Joon Sik Park† and Jong Won Lee†
- 학술지명 한국재료학회지
- 발행처명 대한금속·재료학회
- 발행국가 국내
- 논문언어 한국어
- 전체저자수 5
홈페이지
논문 초록 (Abstract)
Si3N4 is a ceramic material attracting attention in many fields because of its excellent abrasion resistance. In addition, Ti and TiAl alloys are metals used in a variety of high temperature environments, and have attracted much attention because of their high strength and high melting points. Therefore, study of the interface reaction between Si3N4 / Ti and Si3N4 / TiAl can be a useful practice to identify phase selection and diffusion control. In this study, Si3N4 / Ti5Si3 + TiN / TiN / Ti diffusing pairs were formed in the Si3N4 / Ti interfacial reaction and Si3N4 / TiN(Al) / Ti3Al / TiAl diffusion pathway was identified in the Si3N4 / TiAl interfacial reaction. The diffusion layers of the interface reactions were identified and, to investigate the kinetics of the diffusion layer, the integrated diffusion coefficients were estimated.