논문 해외 국제일반학술지 Design and fabrication of diffractive optical elements by use of gray-scale photolithography
- 학술지 구분 국제일반학술지
- 게재년월 2005
- 저자명 J. Sohn, M. Lee, W. Kim, E. Cho, T. Kim, C. Yoon, N. Park, and Y. Park
- 학술지명 Applied Optics
- 발행처명 Optical Society of America
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 7
홈페이지논문 초록 (Abstract)
Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 microm in diameter and 5.9 microm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.