논문 해외 국제전문학술지(SCI급) Graphite Pellicle: Physical Shield for Next-Generation EUV Lithography Technology
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2023-04
- 저자명 Hyung Woo Choi, Ki‐Bong Nam, Dong‐Wook Shin
- 학술지명 Advanced Materials Interfaces
- 발행처명 Wiley
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 3
- 원문 링크 https://onlinelibrary.wiley.com/doi/full/10.1002/admi.202202489
홈페이지논문 초록 (Abstract)
Extreme ultraviolet lithography (EUVL) is widely employed in the electronics, automotive, military, and AI computing areas for IC chip fabrication. A pellicle is a thin and transparent membrane that protects a costly photomask, known as a reticle, during the EUVL process. The fabricated IC chip can be disastrous without a pellicle. When a particle lands on a photomask, it frequently results in a faulty pattern, which leads to chip failure and lower production yield. A nanometer-thick graphite (NGF) has demonstrated tremendous potential for addressing optical, mechanical, thermal, and chemical criteria among potential pellicle materials such as carbon allotropes, Si, SiNx, and Si-Mo-Nb. This review summarizes current progress in NGF pellicles, including large-scale material fabrication (up to 135 mm × 135 mm), transfer method for freestanding form, and practical characterization methods. Current significant challenges and future opportunities for NGF pellicles are also discussed in order to facilitate a critical transition from lab-scale research to industrial-scale implementation.