논문 해외 국제전문학술지(SCI급) Development of a reflective 193-nm DUV microscope system for defect inspection of large optical surfaces
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2019-12
- 저자명 김건희
- 학술지명 Applied Sciences (Switzerland)
- 발행처명 MDPI AGindexing@mdpi.com
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 8
홈페이지논문 초록 (Abstract)
We developed a 193-nm deep ultraviolet (DUV) microscope system based on the reflection mode for a precise inspection of various ypes of defects/cracks on large optial surfaces of the order of one meter in size. Without preprocessing the sample at room temperature and atmospheric pressure, which is commonly necessary for electron microscopy, the reflective 193-nm DUV microscope was used to directly observe optical surface defects in a manner similar to conventional optical microscopes. In addition, the limitations on the selection of materials and thickness of optical samples of transmittive DUV microscopes were overcome. DUV microscope imaging and the analysis on the spatial resolution were verified using a 1D grating structure with a 225-nm line width. This system could be widely applied as an inspection tool because it provides high resolution at the 200-nm scale that is close to the diffraction limit of a 193-nm DUV beam. In the near future, it is expected that our system would be extended to nano/bio imaging as well as the inspection of large optical surfaces.