논문 해외 국제일반학술지 EFFECT OF SUBSTRATE TEMPERATURE ON ZNO THIN FILM FABRICATION BY USING AN ATMOSPHERIC PRESSURE COLD PLASMA GENERATOR
- 학술지 구분 국제일반학술지
- 게재년월 2011-02
- 저자명 김윤기
- 학술지명 PHYSICA STATUS SOLIDI (C) CURRENT TOPICS IN SOLID STATE PHYSICS
- 발행처명 Wiley - V C H Verlag GmbbH & Co.
- 발행국가 해외
- 논문언어 외국어
홈페이지논문 초록 (Abstract)
Under atmospheric pressure, homogeneous non-equilibrium cold plasma was generated stably by high voltage pulsed power (1 kV, 20 kHz) excitation of He and O2 gases. By feeding Zn-MOPD (C18H30O6Zn) into this plasma with He carrier gas, transparent flat ZnOfilms about 240 nm thick w ere successfully fabricated on glass substrates directly under a slit ma de into the cathode. Transmittance of the film is about 80% in the wavelength range from 400 to 600 nm. An XRD measurement reveale d that these ZnOfilms had a c-axis oriented polycrystalline structure . By increasing the substrate temperature from 250 to 400 °C, elect rical resistivity of the film decreased from 0.42 Ωm to 9.4 × 10 Ω m. A high temperature of the substrate may change the growth pattern of ZnO film and its microstructure. © 2011 WILEY-VCH Verlag GmbH Co. KGaA, Weinheim.