논문 해외 국제전문학술지(SCI급) The Effect of Reactive Sputtering on the Microstructure of Parylene-C
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2022-08
- 저자명 이재현
- 학술지명 MATERIALS
- 발행처명 MDPI
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 7
홈페이지논문 초록 (Abstract)
Sputtering technique involves the use of plasma that locally heats surfaces of substrates during the deposition of atoms or molecules. This modifies the microstructure by increasing crystallinity and the adhesive properties of the substrate. In this study, the effect of sputtering on the microstructure of parylene-C was investigated in an aluminum nitride (AlN)-rich plasma environment. The sputtering process was carried out for 30, 45, 90 and 120 min on a 5 mu m thick parylene-C film. Topography and morphology analyses were conducted on the parylene-C/AlN bilayers. Based on the experimental data, the results showed that the crystallinity of parylene-C/AlN bilayers was increased after 30 min of sputtering and remained saturated for 120 min. A scratch-resistance test conducted on the bilayers depicted that a higher force is required to delaminate the bilayers on top of the substrate. Thus, the adhesion properties of parylene-C/AlN bilayers were improved on glass substrate by about 17% during the variation of sputtering time.