논문 해외 국제전문학술지(SCI급) Positive Deviation from a Hall-Petch Relation in Nanocrystalline Aluminum
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2009-02
- 저자명 H. J. Choi1;*, S. W. Lee1;*, J. S. Park2 and D. H. Bae1
- 학술지명 Materials Transactions
- 발행처명 J-STAGE
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 4
홈페이지첨부 파일
논문 초록 (Abstract)
The grain size dependence of yield stress has been investigated for nanocrystalline (nc) bulk aluminum produced by hot extrusion of ball-milled powders. The Hall-Petch slope is positively deviated as the grain size is reduced below 60 nm. For the specific grain size range from 60 nm down to 48 nm, structural analyses and estimation of deformation mechanism exhibit that perfect dislocation emission critically governs deformation of nc aluminum, since the inherent aluminum properties of high stacking fault energy and low twinability can not afford any other deformation modes.