논문 해외 국제전문학술지(SCI급) Free-standing hybrid Zr/NGF filter for high-power EUV purification in EUV lithography
- 학술지 구분 국제전문학술지(SCI급)
- 게재년월 2026-05
- 저자명 Myeong Jin Jeong , Ki-bong Nam, Munja Kim, Dong-Wook Shin, Ji-Beom Yoo
- 학술지명 Diamond and Related Materials
- 발행국가 해외
- 논문언어 외국어
- 전체저자수 5
- 연구분야 공학 > 재료공학
- 원문 링크 https://www.sciencedirect.com/science/article/pii/S0925963526003729
홈페이지논문 초록 (Abstract)
A spectral purity filter (SPF) designed for an extreme ultraviolet (EUV) lithography system consists of a free-standing ultrathin material—such as silicon, zirconium, molybdenum, or metal silicides—supported by a meshed frame to selectively transmit EUV radiation at 13.5 nm while effectively filtering out-of-bands (OoBs) emissions produced by the laser-produced plasma (LPP). Despite the progress in SPF for EUV light purification, the implementation of a hybrid layered filter has yet been demonstrated. In this study, we present the development of a hybrid zirconium/nanometer-thick graphite film (Zr/NGF) layered filter and evaluate its optical and thermal properties in comparison to a zirconium filter. The hybrid Zr/NGF SPF exhibits increased emissivity, enabling more efficient infrared (IR) radiation dissipation, which mitigates thermal damage and concurrently enhances EUV transmittance. This layered filter architecture establishes a foundation for realizing superior thermal management and improved suppression of OoB radiation in SPFs, thereby facilitating the generation of high-power, high-purity EUV light.